Tresneria galeria
NanoGUNEko adituek kudeatzen dute eta arlo anitzetako ikerlariek erabiltzen dute.
NanoGUNEko Kanpo Zerbitzuen sailak karakterizazio eta fabrikazio zerbitzuen sorta zabala eskaintzen die industria eta akademiako kanpo erabiltzaileei.
Hemen behean, nanoGUNEren tresneria aurkezten da.
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Ion Beam Etcher (4Wave) -
Quantum Design SQUID-VSM EverCool -
Quantum Design PPMS -
Magneto-Optical Kerr Effect (MOKE) set-up -
Magneto-Optical Kerr Effect (MOKE) microscope -
UHV Sputtering System (AJA Int.) -
Oerlikon - UNIVEX 350 / EPVD75 Kurt J. Lesker -
ALD Cambridge Nanotech Savannah S100 -
Leica EM MED020 / Quorum technologies Q150 T ES -
Electron-Beam Lithography (Raith -150-TWO / E-line) -
Dual-beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S -
Atomic-Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments) -
X-ray reflectivity/diffractometry (X'pert PRO by PANalytical) -
High power industrial Picosecond Laser -
High-resolution Transmission Electron Microscope (HRTEM) -
Four point probe -
STM/AFM (4 K) in UHV with light detection set-up -
STM/AFM (1 K) in UHV with magnetic field -
Electrospinning -
Reactive ion etcher (RIE Oxford Plasmalab 80 Plus) -
Spectroscopic ellipsometrer (GES5 spectroscopic-ellipsometer SEMILAB) -
RAMGRABER Wet benches -
Double Pack Oven, 650ºC UNITEMP RSO-650-200 -
ALD Beneq TFS 200 -
Mask aligner (EVG) -
FTIR Spectrometer PerkinElmer Frontier -
Environmental Scanning-electron Microscope (eSEM-FEI Quanta 250) -
FTIR Spectrometer PerkinElmer Frontier -
Scattering-type near-field microscope (NeaSpec) -
Plasma asher -
Universal mechanical tester (UMT) -
Microscopy Platform for Materials Research -
UV-NIR Spectrometry -
3D Optical Profiler -
Surface Plasmon Resonance Platform -
NIR Raman spectroscopy -
Atomic-Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments) -
Spectroscopic ellipsometer (GES5 spectroscopic-ellipsometer SEMILAB) -
Scattering-type near-field microscope (Neaspec) -
CRYO Plasma FIB
Areto garbia
300m2-ko areto garbiak ISO 5 (Class 100) eta ISO 7 (Class 1000) klasifikazioa duten guneak ditu, eta nanofabrikazio eta nanokarakterizazio prozesuetarako erabiltzen da.
Azpiegitura eta tresneria
6 200m2 -ko aparteko azpiegitura, 300m2 -ko areto garbia eta 15 laborategi ultra-sentikor, puntako tresneriarekin hornituak.