UHV Sputtering System (AJA Int.)
Offered as External Service
We have two UHV Magnetron Sputtering system for high quality single or multiple layer thin film growth, one in the cleanroom and another one in the Deposition Laboratory.
Research group
Technical characteristics
- Confocal 7 magnetron sputtering guns (DC / RF)
- RF bias available
- Base pressure 10-8 Torr
- Sample holder: 4” compatible and possibility to heat (up to 850 °C) or cool the sample (liquid nitrogen cooler)
- Reactive gasses: nitrogen and oxygen
Equipment
Cleanroom
CR4 - Deposition Bay
Related Techniques
Cleanroom
The nanoGUNE cleanroom, dedicated to fabricate and characterize the properties of materials on the nanoscale, ia a 300m2 laboratory where the air purity is under strict supervision.
Equipment
State-of-the-art equipment, including electron and scanning-tunneling microscopes, as well as other nanofabrication and characterization tools, are managed by specialists and used by researchers from a wide variety of fields.