Oerlikon - UNIVEX 350 / EPVD75 Kurt J. Lesker
Offered as External Service
E-beam/Thermal Evaporator for single or multiple layer thin film growth
Research group
Technical characteristics
- Multi pocket e-beam and thermal evaporation.
- Deposited thickness control by quartz crystal monitor.
- Deposition pressure of 10-6 - 10-7 mbar.
- Sample holder: 4” compatible and possibility to heat up to 350 °C
Cleanroom
CR4 - Deposition Bay
Related Techniques
Cleanroom
The nanoGUNE cleanroom, dedicated to fabricate and characterize the properties of materials on the nanoscale, ia a 300m2 laboratory where the air purity is under strict supervision.
Equipment
State-of-the-art equipment, including electron and scanning-tunneling microscopes, as well as other nanofabrication and characterization tools, are managed by specialists and used by researchers from a wide variety of fields.