Mask aligner (EVG)
Offered as External Service
Optical Lithography for microstructure fabrication.
Research group
Technical characteristics
- Possibility of contact and proximity optical lithography process
- Easily minimum size achievable of 5 μm
- Possibility to pattern areas of up to 4” wafers
- Wide range of mask types
- UV lamp (15 mW /cm2)
Equipment
Cleanroom
CR2 - Photo Bay
Related Techniques
Cleanroom
The nanoGUNE cleanroom, dedicated to fabricate and characterize the properties of materials on the nanoscale, ia a 300m2 laboratory where the air purity is under strict supervision.
Equipment
State-of-the-art equipment, including electron and scanning-tunneling microscopes, as well as other nanofabrication and characterization tools, are managed by specialists and used by researchers from a wide variety of fields.