RAMGRABER Wet benches
Sample processing stations specialized for chemical and lithography processes.
Technical characteristics
- 5 wet benches: 2 acid wet benches, 2 solvents wet benches and 1 basis wet bench.
- Ultrasonic bath sonicators with variable power and temperature
- Spin coaters maximum 8000 rpm (4” substrates)
- Hot plates maximum temperature 300 ºC (4” substrates)
- Pure N2 gas guns
- DI water guns
- Overflow sinks
Equipment
Cleanroom
CR2 - Photo Bay
Related Techniques
Cleanroom
The nanoGUNE cleanroom, dedicated to fabricate and characterize the properties of materials on the nanoscale, ia a 300m2 laboratory where the air purity is under strict supervision.
Equipment
State-of-the-art equipment, including electron and scanning-tunneling microscopes, as well as other nanofabrication and characterization tools, are managed by specialists and used by researchers from a wide variety of fields.