Lifting off a zen garden
![Lifting off a zen garden](/sites/default/files/styles/imagen_full_1024/public/20._maria_barra.jpg?itok=KrT3G_l0)
SEM image taken after partial lift-off of Cr/Al on a silicon oxide substrate. Designed by electron beam lithography, each array is formed by ten ribbons, of width 75 nm and length 50 um. After the lithography, 5 nm of Cr and 50 of Al were deposited. To recover the structures, the sample is immersed in acetone. The structure was frozen during the process, resembling a brush painting a nano zen garden.
Image taken by Maria Barra Burillo.
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