Ion beam etching and sputtering system.
AFM/MFM microscope with both temperature control up to 250 ºC and in-situ magnetic field.
X-ray diffraction for enabling wide-ranging structural characterizations such as layer crystallinity, grain size analysis, epitaxial relations, layer thickness and interface intermixing, allowing f
Magnetic field measurement system with a temperature range of 2-400 K, magnetic fields up to 7 Tesla and resolution of 10-8 emu in magnetic moment.
Physical properties measurement system with a temperature range of 2-300 K, and magnetic fields up to 9 Tesla.
MOKE instrument with the ability to detect rotations of the polarization as small as 10 nanoradiants for measurements of in-plane as well as out-of-plane magnetization.
Kerr microscopy for the study of lateral magnetization states with about 0.5 μm resolution.
We have two UHV Magnetron Sputtering system for high quality single or multiple layer thin film growth, one in the cleanroom and another one in the D
E-beam/Thermal Evaporator for single or multiple layer thin film growth
Atomic Layer Depostion (ALD ), Evaporation thecnique for deposition of wide variety of materials (Al2O3, HfO2, ZnO, TiO2 and other oxides, nitrides and metals) on flat substrates (e.g.
Table top basic sputtering for thin film growth of metals for basic coatings or contact fabrication
E-Beam Lithography used for design and nanostructure fabrication.
Focused Ion Beam (FIB) and Focused electron/ion beam induced deposition (FE(I)BID), system used for surface patterning and complex structures fabrication.
Optical Lithography for microstructure fabrication.
ESEM provides access to studies of wet biological samples, nano-bio composites and nano-fluidic phenomena.
Ultra-Low-Temperature (4.8 K) Ultra-High-Vacuum Scanning Tunneling and Atomic Force Microscope (STM-AFM). It has a light emission spectroscopy set-up.
Ultra-Low-Temperature (1.1 K) Ultra-High-Vacuum Scanning Tunneling and Atomic Force Microscope (STM-AFM).
One of the home-built electrospinning setups.
The NeaSNOM from Neaspec GmbH is a combined scattering-type scanning near-field optical microscope (s-SNOM) and nanoscale Fourier transform infrared spectroscopy (nano
System for etching/milling material by a chemically reactive gases
Measures a wide range of layer thicknesses and material optical properties in a non-destructive manner.
Sample processing stations specialized for chemical and lithography processes.
High temperature oven used for heat treatments such a annealing and oxidation of thin film layers.
Our lab hosts a versatile Scanning Probe setup from Attocube Gmbh (AttoLiquid2000) equipped for Confocal Microscopy, Atomic and Magnetic Force Microscopy and customized for Scanning Tunnelling Micr
The Beneq TFS 200 Atomic Layer Deposition (ALD) system is designed for advanced thin film research purposes, with both thermal ALD capability, and plasma option for Plasma-Enhanced ALD (PEALD), in